Publication: 27.08.2012 19:36
Dernière mise à jour: 27.08.2012 23:31
Délai: 08.08.2013 02:00
A French ISO 9001 company located near Paris (France) has developed an innovative process in the field of microlithography. Its technologies are used in the manufacturing of optical components reaching the strongest requirements of Aeronautics, Space & Defense, Astronomy and Optics.
The company is proposing its expertise in chemical wet etching for technical cooperations or commercial agreement with technical assistance.
A French ISO 9001 company located near Paris (France) has developed an innovative process in the field of microlithography. Its technologies are used in the manufacturing of optical components reaching the strongest requirements of Aeronautics, Space & Defense, Astronomy and Optics. Achievement of parts showing microscaled patterns is usually done by photolithography. A photomask is generated according a desired design. It consists in a plate with areas that are transparent or opaque to the UV light. The surface of the part to be etched is metallized and recovered with a photoresist. The mask is then laid on this surface and the system is thereafter placed under a UV light : the transparent areas of the mask allows the resist located just below to be insulated whereas the opaque areas let the resist unchanged. Many wet chemicals treatments will then remove the non isolated resist and the metallic layer just below. By this way, the remaining metallic will only correspond to the image of the mask. The achieved microscaled patterns are highly involved in the manufacture of reticles, micrometers and filters. The team of the company controls the set of skills and technologies related to the photolithography (of 1 micrometer to 0.1 micrometer) and also provides an additional technique to it : following the resist development step, the substrate can be etched in depth, allowing the achievement of parts dedicated to night vision or grating network. The French company is proposing its expertise in chemical wet etching for technical cooperations or commercial agreement with technical assistance.
Using the wet etching allows the process to be applied with a high efficiency (both in terms of yield and duration) to many types of substrates (from glass to metal). It can create extremely small patterns on pieces ranging from 400mm to 1mm diameter.
Advantages to other etching methods are, beside the costs efficiency, the ability to control the surface (in terms of rugosity) of the etched areas.
The company's expertise allows to work also on curved surfaces.
Regarding the the traditional metallic etching, the company also perform deep etching (up to 10 micrometers) which main application is the night vision.
The company is used to work with industrial with strict technical specifications, such as aeronautics and spatial where no defect is allowed.
The company is ISO- certified since 1999 and ensures clean operating conditions. Its small organisation allows it to react promptly and to answer quickly to any specific request.
Already on the market
Type of organisation: Industry
Size of organisation: 11-50
The partnership could also adress Industry or Research organisation.
- Specific area of activity of the partner: producer, integrator of micro-electronic components (wafers, ...) in aeronautics, military, electronic and medical sectors.
- Task to be performed by the partner sought: provide the technical specifications, following an agreement for commercial collaboration. Pieces to be processed can be provided by the partner or by the company.